Developing Solution
Eclat Forever Machinery provides high-performance developing equipment designed for precise and reliable development processes. This solution utilizes developers such as TMAH, KOH, and K₂CO₃ to effectively remove photoresist and accurately define circuit patterns.
Based on different process requirements, optimized spray nozzles or liquid knife systems are selected, combined with specialized spray designs to achieve excellent development uniformity. In addition, defoamed DI water rinsing, exhaust airflow fluid dynamics, and chemical leakage prevention designs are integral components of the system.
These measures ensure stable substrate quality after development, enabling the processed substrates to fully meet the required conditions for subsequent process steps.