Developing Solution
Eclat Forever Machinery provides high-performance developing equipment designed for
precise and reliable development processes. This solution utilizes developers such
as TMAH, KOH, and K₂CO₃ to effectively remove photoresist and accurately define
circuit patterns.
Based on different process requirements, optimized spray nozzles or liquid knife
systems are selected, combined with specialized spray designs to achieve excellent
development uniformity. In addition, defoamed DI water rinsing, exhaust airflow
fluid dynamics, and chemical leakage prevention designs are integral components of
the system.
These measures ensure stable substrate quality after development, enabling the
processed substrates to fully meet the required conditions for subsequent process
steps.